发明名称 |
Method of forming film pattern, device, method of manufacturing device, electro-optical device, and electronic apparatus |
摘要 |
A method of forming a film pattern by disposing functional liquid on a substrate includes: forming banks on the substrate; disposing the functional liquid in regions partitioned by the banks; and drying the functional liquid disposed on the substrate. The forming of the banks includes forming a thin film on the substrate, the thin film being made of a material for forming the banks, performing lyophobic treatment on a surface of the thin film, and patterning the thin film into the shapes of the banks.
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申请公布号 |
US2006178014(A1) |
申请公布日期 |
2006.08.10 |
申请号 |
US20060347689 |
申请日期 |
2006.02.03 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
MORIYA KATSUYUKI;HIRAI TOSHIMITSU |
分类号 |
H01L21/31 |
主分类号 |
H01L21/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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