发明名称 Method of forming film pattern, device, method of manufacturing device, electro-optical device, and electronic apparatus
摘要 A method of forming a film pattern by disposing functional liquid on a substrate includes: forming banks on the substrate; disposing the functional liquid in regions partitioned by the banks; and drying the functional liquid disposed on the substrate. The forming of the banks includes forming a thin film on the substrate, the thin film being made of a material for forming the banks, performing lyophobic treatment on a surface of the thin film, and patterning the thin film into the shapes of the banks.
申请公布号 US2006178014(A1) 申请公布日期 2006.08.10
申请号 US20060347689 申请日期 2006.02.03
申请人 SEIKO EPSON CORPORATION 发明人 MORIYA KATSUYUKI;HIRAI TOSHIMITSU
分类号 H01L21/31 主分类号 H01L21/31
代理机构 代理人
主权项
地址