发明名称 |
ÄTZKAMMERN MIT PLASMA DICHTE UND GERINGER KONTAMINATION UND HERSTELLUNGSVERFAHREN DERSELBEN |
摘要 |
A plasma processing chamber having a chamber liner and a liner support, the liner support including a flexible wall configured to surround an external surface of the chamber liner, the flexible wall being spaced apart from the wall of the chamber liner. The apparatus can include a heater thermally connected to the liner support so as to thermally conduct heat from the liner support to the chamber liner. The liner support can be made from flexible aluminum material and the chamber liner comprises a ceramic material. The flexible wall can include slots which divide the liner support into a plurality of fingers which enable the flexible wall to absorb thermal stresses. |
申请公布号 |
DE69928289(T2) |
申请公布日期 |
2006.08.10 |
申请号 |
DE1999628289T |
申请日期 |
1999.09.24 |
申请人 |
LAM RESEARCH CORP. |
发明人 |
WICKER, E.;MARASCHIN, A.;KENNEDY, S. |
分类号 |
H01J37/32;H05H1/46;C23C16/44;H01J27/16;H01J37/00;H01J37/08;H01J37/36;H01L21/205;H01L21/302;H01L21/3065 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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