发明名称 MANUFACTURING METHOD OF SILICON FINE PARTICLE AND MANUFACTURING METHOD OF TITANIUM OXIDE FINE PARTICLE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method capable of manufacturing simply and with good productivity silicon fine particle and titanium oxide fine particle which can be preferably used in a light receiving element, a light emitting element or the like. SOLUTION: The manufacturing method of silicon fine particle comprises dissociating silicon from a silicon hydride by bringing a raw material gas containing the silicon hydride into contact with a heated catalyst comprising either one of tungsten, tantalum, carbon, molybdenum and titanium or a compound thereof, and at the same time aggregating the dissociated silicon by raising the pressure of the raw material gas to high pressure capable of aggregating the dissociated silicon to form silicon fine particle. Whereby the aggregation of silicon is promoted and silicon fine particle is efficiently formed. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006206371(A) 申请公布日期 2006.08.10
申请号 JP20050019701 申请日期 2005.01.27
申请人 KYOCERA CORP 发明人 KOMOTA MANABU;HIGUCHI HISASHI
分类号 C01B33/027;C01G23/07 主分类号 C01B33/027
代理机构 代理人
主权项
地址