发明名称 ALIGNER, ILLUMINANCE DISTRIBUTION CORRECTION FILTER, AND PROCESS FOR FABRICATING SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide an aligner in which light transmittance distribution of a light illuminance distribution correction filter can be updated inexpensively and quickly. <P>SOLUTION: The aligner comprises a light source 1, a section 28 for holding a reticle being irradiated with light from the light source 1, a fly eye lens 22 having a plurality of lens elements 22a and arranged between the reticle holding section 28 and the light source 1, an illuminance distribution correction filter 30 having a plurality of liquid crystal cells arranged in matrix and interposed between the light source 1 and the fly eye lens 22 in order to correct illuminance distribution of light for the plurality of lens elements 22a, and a section 50 for controlling the plurality of liquid crystal cells respectively. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006210553(A) 申请公布日期 2006.08.10
申请号 JP20050019268 申请日期 2005.01.27
申请人 SEIKO EPSON CORP 发明人 USHIYAMA FUMIAKI
分类号 H01L21/027;G02B3/00;G02B5/00;G02B27/00;G02F1/13;G03F7/20 主分类号 H01L21/027
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