发明名称 |
MANUFACTURING METHOD OF BIPOLAR TRANSISTOR AND BIPOLAR TRANSISTOR MANUFACTURED THEREWITH |
摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of voltage resistance and high power bipolar transistor having improved a direct current amplifying coefficient. SOLUTION: A base electrode pattern 9a and an emitter electrode pattern 10a are formed respectively on the upper part of a base region 3 and an emitter region 4. As the forming method, an Al film is formed with the sputtering process from aluminum (Al) as an electrode material and this film is changed to an electrode pattern with the dry etching process. Next, the base electrode 9b and emitter electrode 10b where the surfaces thereof are oxidized are formed through the heat treatment under the atmosphere of water as the oxidizing agent and oxygen. COPYRIGHT: (C)2006,JPO&NCIPI
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申请公布号 |
JP2006210564(A) |
申请公布日期 |
2006.08.10 |
申请号 |
JP20050019426 |
申请日期 |
2005.01.27 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
SODA SHIGETOSHI;NAKAMURA HIDEKAZU;HASHIZUME SHINGO |
分类号 |
H01L21/331;H01L21/28;H01L21/285;H01L29/417;H01L29/732 |
主分类号 |
H01L21/331 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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