| 摘要 |
PROBLEM TO BE SOLVED: To provide a coating method for preventing occurrence of coating unevenness at the time of coating a surface of a substrate with resin. SOLUTION: Humidity in a coater cup 18 of a rotation coating device is maintained to 40 to 50%. A holder 12 holds the substrate 10. Organic solvent is discharged on the substrate by prescribed quantity, and the substrate is rotated at rotating speed of 2,000 rpm. The temperature of the surface of the substrate drops due to evaporation of organic solvent and dew condensation water is formed. Since the substrate is uniformly coated with organic solvent, it is uniformly stuck to a substrate face, and resist is dropped from a nozzle 20 in such a state. COPYRIGHT: (C)2006,JPO&NCIPI
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