CHAMBER LID OPEN APPARATUS OF PLASMA ETCHER,申请号KR20050011216-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	CHAMBER LID OPEN APPARATUS OF PLASMA ETCHER
摘要
申请公布号	KR20060090389(A)	申请公布日期	2006.08.10
申请号	KR20050011216	申请日期	2005.02.07
申请人	SAMSUNG ELECTRONICS CO., LTD.	发明人	CHOI, JONG HOON;WON, YUN JONG;SHIN, SEUNG JIN;JEONG, JONG TAE
分类号	G02F1/13	主分类号	G02F1/13
代理机构		代理人
主权项
地址

您可能感兴趣的专利

VERFAHREN ZUM STEUERN UND BEGRENZEN DER AUSGANGSLEISTUNG EINES DREHZAHLVERAENDERLICHEN MOTORS

TRIAZOLE COMPOUND, MANUFACTURE AND PLANT GROWTH REGULANT COMPOSITION

DISASTER PREVENTION MONITOR/CONTROL EQUIPMENT

VACUUM CONTAINER

STABLEBAR PLAST-LIGGESTOL.

MEJORAS EN UNA BOMBA PARA LA LUBRICACION DE UN ROTOR DE TURBOSOPLANTE DE MOTORES DE COMBUSTION INTERNA

PROCESS FOR PREPARATION OF N-(2-CLORO-4-NITROPHENYL)-BENZENESULPHON AMIDE DERIVATIVES

VERFAHREN ZUR MIKROBIELLEN ANAEROBEN GEWINNUNG VON ESSIGSAEURE

PROCESS AND PLANT FOR SEPARATING A GASEOUS MIXTURE BY ADSORPTION

DECAFFEINATING GREEN COFFEE

PYRIMIDINE CARBOXALDEHYDES

HEAT TREATING BEARING MATERIALS

FALL-ARREST APPARATUS

POLYM ACRYLIC/DIENE I.P.O. METHYLISOBUTYLKETONE AND IONIC SURFACTANT

COUNTING OBJECTS WITHIN A GIVEN AREA

PORTABLE SOURCE OF ULTRA-VIOLET RADIATION

INTEGRATED CIRCUIT DEVICE

LOW DEW POINT DEHUMIDIFIER

AUTOMATIC RECEPTION AND ACCOUNTING SYSTEM