发明名称 METHOD FOR MANUFACTURING SUBSTRATE COATED WITH SILICON OXIDE MEMBRANE
摘要 <P>PROBLEM TO BE SOLVED: To provide a simple and highly productive method for manufacturing a strong substrate coated with a silicon oxide membrane, which has high wear resistance and transparency and which can be converted into a thick membrane. <P>SOLUTION: The silicon oxide membrane is produced on the substrate by applying on the surface of the substrate a process liquid which contains an organosilicon compound having a polysilsesquioxane structure and a hydroxy group at the terminal, a resin having a heat decomposition temperature of 300-550&deg;C and an organic solvent at the weight ratio (M/N) of the organosilicon compound (M) to the resin (N) of 1-25, and then drying the process liquid at 50-200&deg;C so as to remove the organic solvent, and thereafter firing the processed substrate at 500-800&deg;C. The resin having a heat decomposition temperature of 300-550&deg;C can be specifically ethyl cellulose. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006206411(A) 申请公布日期 2006.08.10
申请号 JP20050023746 申请日期 2005.01.31
申请人 MITSUBOSHI BELTING LTD 发明人 TSUTSUI YOSHIYA
分类号 C03C17/25;G02B1/10 主分类号 C03C17/25
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