| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an exhaust gas detoxifying method able to obtain sufficient detoxifying effects even if a detoxifying device has a low exhaust gas decomposition capacity, and its detoxifying system, and a manufacturing system of electron devices. <P>SOLUTION: The method of detoxifying-treating the exhaust gas discharged from a dry etching device 30 by using the detoxifying device 1 is provided. The exhaust gas discharged from the dry etching device 30 is introduced into the detoxifying device 1, and a detoxifying treatment is carried out. Next, the exhaust gas after the detoxifying treatment by the detoxifying device 1 is discharged from the detoxifying device 1, and again introduced into the detoxifying device 1 to be detoxifying-treated, by which a decomposition rate of the exhaust gas in the whole detoxifying system 10 can be increased even if the exhaust gas decomposition capacity of the detoxifying device 1 is low. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
