| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of forming a nozzle for an ejection device, through application of which, a nozzle having a stepwise cross-section can be efficiently and simply formed. SOLUTION: In the method of forming a nozzle for the ejection device by etching a silicon monocrystalline substrate to form the nozzle, a resist film is formed on a surface of the silicon monocrystalline substrate. A first opening pattern is formed by removing the resist film at a portion corresponding to the rear end side of the nozzle, and a second opening pattern which is smaller than the first opening pattern is formed by removing the resist film at a portion corresponding to the front end side of the nozzle. Anisotropic dry etching is applied to the exposed portions of the silicon monocrystalline substrate surface exposed by the first and second opening patterns, to form a nozzle having a cross-section made smaller stepwise from the rear end side toward the front end side. COPYRIGHT: (C)2006,JPO&NCIPI
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