发明名称 Manufacturing structure of assembly of photoelectric semiconductor wafer involves covering large area of wafer by current conducting material and photoelectric semiconductor is then stacked on current conducting material
摘要 <p>The method involves a wafer (10) with a given place (18) for connecting with flip-chip and a large area of the place is covered with current conducting material. A photoelectric semiconductor is stacked on the current conducting material and then photoelectric semiconductor chip (12) is packed with high molecular weight materials (14) for formation of semi-finished product. The semi-finished product is cut for formation of photoelectric structure of different dimensions or individual units.</p>
申请公布号 DE102006003567(A1) 申请公布日期 2006.08.10
申请号 DE20061003567 申请日期 2006.01.25
申请人 HARVATEK CORP. 发明人 WANG, BILY;CHUANG, JONNIE;LIN, CHUAN-FA;HUNG, CHI-WEN
分类号 H01L33/00;H01L21/50;H01L25/075 主分类号 H01L33/00
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