发明名称 |
Manufacturing structure of assembly of photoelectric semiconductor wafer involves covering large area of wafer by current conducting material and photoelectric semiconductor is then stacked on current conducting material |
摘要 |
<p>The method involves a wafer (10) with a given place (18) for connecting with flip-chip and a large area of the place is covered with current conducting material. A photoelectric semiconductor is stacked on the current conducting material and then photoelectric semiconductor chip (12) is packed with high molecular weight materials (14) for formation of semi-finished product. The semi-finished product is cut for formation of photoelectric structure of different dimensions or individual units.</p> |
申请公布号 |
DE102006003567(A1) |
申请公布日期 |
2006.08.10 |
申请号 |
DE20061003567 |
申请日期 |
2006.01.25 |
申请人 |
HARVATEK CORP. |
发明人 |
WANG, BILY;CHUANG, JONNIE;LIN, CHUAN-FA;HUNG, CHI-WEN |
分类号 |
H01L33/00;H01L21/50;H01L25/075 |
主分类号 |
H01L33/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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