| 发明名称 |
PHOTORESIST COMPOSITION, METHOD FOR FORMING A PATTERN USING THE SAME, AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR ARRAY PANEL USING THE SAME |
| 摘要 |
<p>A photoresist composition includes a novolac resin having where each of R1, R2, R3, and R4 is an alkyl group having a hydrogen atom or between one through six carbon atoms and n is an integer ranging from zero through three; and a mercapto compound having <?in-line-formulae description="In-line Formulae" end="lead"?>Z1-SH, or<?in-line-formulae description="In-line Formulae" end="tail"?> <?in-line-formulae description="In-line Formulae" end="lead"?>SH-Z2-SH,<?in-line-formulae description="In-line Formulae" end="tail"?> where each of Z1 and Z2 is an alkyl group or an alkyl group having one through twenty carbon atoms, a sensitizer, and a solvent.</p> |
| 申请公布号 |
KR20060089923(A) |
申请公布日期 |
2006.08.10 |
| 申请号 |
KR20050010038 |
申请日期 |
2005.02.03 |
| 申请人 |
SAMSUNG ELECTRONICS CO., LTD.;SAMYANGEMS CO., LTD. |
发明人 |
PARK, JEONG MIN;RYU, MI SUN;LEE, HI KUK;JEON, WOO SEOK |
| 分类号 |
G03F7/004 |
主分类号 |
G03F7/004 |
| 代理机构 |
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| 主权项 |
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