| 摘要 |
PROBLEM TO BE SOLVED: To provide a processing apparatus which can appropriately remove organic substances stuck to a substrate by cleaning. SOLUTION: The processing apparatus is used to clean a substrate, and it is provided with a steam processor 1 which uses heated steam to peel off/remove organic substances, a chemicals processor 21 which processes the substrate processed in the steam processor and dissolves/removes the organic substances on the substrate, and a rinsing section 31 to rinse the substrate processed in the chemicals processor. COPYRIGHT: (C)2006,JPO&NCIPI
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