发明名称 CHARGED BEAM EXPOSURE DEVICE
摘要 PROBLEM TO BE SOLVED: To prevent that a member arranged inside a lens barrel is charged or polluted, and the deterioration of a drawing performance is minimized. SOLUTION: A charged beam source, blanking electrodes 17a and 17b which deflect the charged beam, and a blanking aperture 18 which covers the particle beam deflected by this blanking electrode, are used. It has a conductive module for absorbing reflective electrically charged particle 16 or generated electrically charged particle 16 by this blanking aperture 18. The above conductive module is arranged rather than the blanking aperture 18 at the side of the charged beam source, and a voltage of reverse polarity to the charged beam is applied. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006210457(A) 申请公布日期 2006.08.10
申请号 JP20050017697 申请日期 2005.01.26
申请人 CANON INC;HITACHI HIGH-TECHNOLOGIES CORP 发明人 MIZUSHIMA MACHIKO;KAMIMURA OSAMU
分类号 H01L21/027;G03F7/20;H01J37/09;H01J37/305 主分类号 H01L21/027
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