发明名称 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE TRANSFER APPARATUS AND SUBSTRATE CONTROL METHOD
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing apparatus etc. capable of reducing the weight of the apparatus and cost burden etc. , while maintaining processing accuracy. SOLUTION: The substrate processing apparatus 1 has a processing unit 5, an X-direction moving stage 7, an alignment stage (Y-direction moving stage andθdirection moving stage) 9, an air float unit 11 and a roller 13 etc. The stage 7 has an X-direction slider 7-1 and an X-direction rail 7-2. The widths (Y-direction length) of the X-direction slider 7-1 and the X-direction rail 7-2 are both smaller than the width of a substrate 3 (Y-direction length). The substrate 3 is placed on the top surface of the X-direction slider 7-1, and the X-direction slider 7-1 moves in an X-direction along the X-direction rail 7-2. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006210393(A) 申请公布日期 2006.08.10
申请号 JP20050016586 申请日期 2005.01.25
申请人 DAINIPPON PRINTING CO LTD 发明人 NAKAMURA HIDENORI;NAKANISHI YUUKI
分类号 H01L21/677;B65G49/06;B65G49/07 主分类号 H01L21/677
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