ALIGNER, ALIGNING METHOD, AND PROCESS FOR FABRICATING DEVICE HAVING MICROPATTERN

摘要

PROBLEM TO BE SOLVED: To provide an EUV aligner in which the lifetime up to overhaul is prolonged by reducing adsorption of organic substances into a reflector as much as possible so that a carbon coating is not formed easily and suppressing deterioration in optical characteristics.

SOLUTION: The aligner comprises a projection optical system having a plurality of reflectors (M1-M6) performing exposure and transfer of a pattern formed on a mask onto a photosensitive substrate using extreme ultravoilet light wherein at least one of the plurality of reflectors is held in a state insulated from the outside.

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