| 摘要 |
PROBLEM TO BE SOLVED: To provide an inspection device for a thin film transistor substrate capable of inspecting the presence of a defect in the thin film transistor substrate, allowing accurate inspection even under a low vacuum condition, capable of coping properly with a change in a size of the thin film transistor substrate, and capable of shortening an inspection time. SOLUTION: This inspection device is constituted of a reference substrate 20 arranged opposedly to the thin film transistor substrate 10, and formed with reference patterns 21 corresponding to pixels 11, an electric power source supply part 40 for supplying an electric power source to the pixels 11 and the reference patterns 21 to form an electric field in a separation space between the thin film transistor substrate 10 and the reference substrate 20, an electron beam emitting unit 30 for emitting an electron beam, an electron beam detecting unit 50 for detecting the electron beam emitted from the electron beam emitting unit 30, and passed through the separation space, and a control part 60 for judging the presence of the defect in the pixels 11 of the thin film transistor substrate 10, based on a detected position of the electron beam. COPYRIGHT: (C)2006,JPO&NCIPI |
