发明名称 Backside coating for MEMS wafer
摘要 A transparent substrate has a micro electromechanical system (MEMS) on a first side of the substrate. An opaque layer is formed on a second side of the transparent substrate opposite the first side. The opaque layer comprises a first material that is removable by a MEMS release process. A second layer is formed on the opaque layer. The second layer comprises a second material that prevents contamination of a front end of line machine by the first material during a front end of line fabrication process.
申请公布号 US2006177992(A1) 申请公布日期 2006.08.10
申请号 US20050056142 申请日期 2005.02.10
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 CHEN FEI-YUH;CHU EUGENE;CHANG YUH-HWA;HO DAVID
分类号 H01L21/00;H01L21/30 主分类号 H01L21/00
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