METHOD FOR PHOTOMASK PLASMA ETCHING USING PROTECTIVE MASK

摘要

PROBLEM TO BE SOLVED: To provide a method for etching a chromium layer during photomask fabrication.

SOLUTION: The invention provides a method for forming a photomask by etching chromium. In one embodiment, a method for etching chromium includes steps of: preparing a film stack having a chromium layer in a processing chamber; patterning a photoresist layer on the film stack; depositing a conformal protective layer on the patterned photoresist layer; etching the conformal protective layer to expose the chromium layer through the patterned photoresist layer; and etching the chromium layer. This method for etching chromium is particularly suitable for fabricating a photomask.

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