发明名称 |
Immersion exposure method and apparatus, and manufacturing method of a semiconductor device |
摘要 |
There is disclosed an immersion exposure method of carrying out an exposure process in a state that liquid is at least partly filled between a substrate to be exposed and a projection optical system of an exposure apparatus carrying out the exposure process, comprising carrying out a process of making large a contact angle to the liquid with at least outer peripheral portion of a main surface of the substrate compared with a contact angle to the liquid with an area adjacent to the outer peripheral portion of the substrate, which area is a part of a surface of a substrate supporting side of a substrate support member supporting the substrate included in the exposure apparatus, and carrying out the exposure process.
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申请公布号 |
US2006177776(A1) |
申请公布日期 |
2006.08.10 |
申请号 |
US20050315000 |
申请日期 |
2005.12.23 |
申请人 |
MATSUNAGA KENTARO;KONO TAKUYA;ITO SHINICHI |
发明人 |
MATSUNAGA KENTARO;KONO TAKUYA;ITO SHINICHI |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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