METHODS FOR FABRICATING NON-VOLATILE SEMICONDUCTOR MEMORY DEVICES AND MEMORY DEVICES FABRICATED THEREBY,申请号KR20050010828-传众专利搜索

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发明名称	METHODS FOR FABRICATING NON-VOLATILE SEMICONDUCTOR MEMORY DEVICES AND MEMORY DEVICES FABRICATED THEREBY
摘要
申请公布号	KR20060090005(A)	申请公布日期	2006.08.10
申请号	KR20050010828	申请日期	2005.02.04
申请人	SAMSUNG ELECTRONICS CO., LTD.	发明人	KIM, MIN SUNG;KIM, KYONG MIN
分类号	H01L27/115	主分类号	H01L27/115
代理机构		代理人
主权项
地址

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