| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate drier capable of equalizing the drying conditions of each section of a substrate without enlarging a treating chamber, a substrate treating system, a manufacturing method for an electro-optical device, the electro-optical device, and electronic equipment. SOLUTION: The substrate drier 3 dries the square wafers W coated with a film-forming solution, in which a film-forming material is melted to a solvent under decompression. The substrate drier 3 has a treating chamber 60 housing the substrates W in an airtight manner, a plurality of exhaust ports 66 formed to the bottom section 68 of the treating chamber 60, and an exhausting means 89 exhausting an atmosphere in the treating chamber 60 via a plurality of the exhaust ports 66. The substrate drier 3 further has exhaust flow paths 91, 92 and 93 connecting a plurality of the exhaust ports 66 and the exhaust means 89. In the substrate drier 3, a plurality of the exhaust ports 66 are dispersed, in the peripheral-section 64 region of the bottom section 68, to which an opening 79 is projected between the set maximum substrate W and an inner wall 78 in the treating chamber 60, and arranged uniformly at each plural in each side of the substrate W. COPYRIGHT: (C)2006,JPO&NCIPI
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