| 摘要 |
<P>PROBLEM TO BE SOLVED: To suppress microscopic deviation of distribution of light quantity, in bridging exposure using a filter. <P>SOLUTION: An exposure device comprising a filter which includes a transmitting region almost uniform in the quantity of transmitting light and shielding regions so formed as to sandwich the transmitting region, an original plate for bridging exposure, a stage on which a substrate is mounted, and light quantity varying means for varying the light quantity on the substrate by a specified width, is prepared. When an optical positional relationship between the original plate and the substrate is a first condition, and a pattern formed in a first original plate region is transferred to a first substrate region. A pattern formed in a second original plate region under the first condition is transferred to a second substrate region. When the optical positional relationship between the original plate and the substrate is a second condition, a pattern formed in a third original plate region is transferred to a third substrate region overlapping with the first substrate region by the specified width. A pattern formed in a fourth original plate region under the second condition is transferred to a fourth substrate region overlapping with the second substrate region by the specified width. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
