| 摘要 |
<P>PROBLEM TO BE SOLVED: To realize a resizing process with high accuracy and improve defect detection sensitivity in a defect inspecting device. <P>SOLUTION: The defect inspecting device, used for detecting a pattern defect in a sample to be inspected comprises a light source 3 with which the sample 1 is irradiated with light; a photoelectric converter section 13 which detects reflected or transmitted light from the sample 1 and acquires measuring pattern data; an expansion circuit 17 which generates expansion data, including a plurality of pixel data sets from design data; a resizing circuit 18 which computes the value, corresponding to a distance between adjacent figures existing near respective pixels of the expansion data, obtains coefficients for every pixel, based on the value corresponding to the distance between the adjacent figures, and applies a filter processing on the expansion data based on the obtained coefficients; an optical filter circuit 19, which generates a standard pattern data based on the filter processed expansion data; and a comparison circuit 7 which compares the measuring pattern data with the standard pattern data. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
