发明名称 |
Method for manufacturing an LCD device |
摘要 |
A method for manufacturing a TFT panel of an LCD device includes the steps of wet etching a multilayer metallic structure including a high-melting-point metal film (HMPM) film, Al film and another HMPM film while using side etching technique by using a photoresist mask, hot-water washing the side walls of the Al film after the wet etching, and dry etching for configuring the channel region of a TFT in each pixel, and removing the photoresist mask. The presence of the photoresist mask and the protection film prevents corrosion of Al caused by plasma of the etching gas in the dry etching.
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申请公布号 |
US2006175286(A1) |
申请公布日期 |
2006.08.10 |
申请号 |
US20060396721 |
申请日期 |
2006.04.04 |
申请人 |
NEC LCD TECHNOLOGIES, LTD |
发明人 |
MATSUSHITA HIDEKAZU;KATOH TSUYOSHI;DOI SATOSHI;MAEDA AKITOSHI |
分类号 |
C30B33/00;G02F1/136;B44C1/22;C23F1/00;G02F1/1362;H01L21/461;H01L21/77;H01L21/84;H01L27/12 |
主分类号 |
C30B33/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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