| 摘要 |
A method for producing a final mask layout ( 20 ') avoids imaging errors. A provisional auxiliary mask layout ( 110 ) is produced, in particular in accordance with a predefined electrical circuit diagram, and is converted into the final mask layout ( 20 ') with the aid of an OPC method. A main structure ( 120, 130 ) of the provisional auxiliary mask layout ( 110 ) is assigned optically non-resolvable auxiliary structures ( 160, 320 ). Exclusively the optically non-resolvable auxiliary structures ( 160, 320 ) are altered in the context of the OPC method, and the main structure ( 120, 130 ) itself remains unaltered.
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