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发明名称
METHOD AND APPARATUS FOR FORMING A PHOTORESIST FILM ON A SEMICONDUCTOR SUBSTRATE
摘要
申请公布号
KR20060090320(A)
申请公布日期
2006.08.10
申请号
KR20050011077
申请日期
2005.02.07
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
KIM, SU HWAN;CHOI, DUG KYU
分类号
G03F7/00
主分类号
G03F7/00
代理机构
代理人
主权项
地址
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