发明名称 Electrostatic deflection system for corpuscular radiation
摘要 <p>An electrostatic diffraction system for corpuscular radiation for micro- and nano-structure lithography or measurement comprises bar electrodes held axially and symmetrically in an inner hollow carrier (1) through which an electron beam is directed. The carrier comprises between two and four mutually connectible carrier elements (1.1,1.2).</p>
申请公布号 EP1688964(A2) 申请公布日期 2006.08.09
申请号 EP20060002118 申请日期 2006.02.02
申请人 LEICA MICROSYSTEMS LITHOGRAPHY GMBH 发明人 RISSE, STEFAN, DR.;PESCHEL, THOMAS, DR.;DAMM, CHRISTOPH;GEBHARDT, ANDREAS;ROHDE, MATHIAS;SCHENK, CHRISTOPH;ELSTER, THOMAS, DR.;DOERING, HANS-JOACHIM;SCHUBERT, GERHARD
分类号 G21K1/087 主分类号 G21K1/087
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