发明名称 |
COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST |
摘要 |
<p>In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a resin component with a blend of distinct resins, wherein at least one resin of the mixture comprises chromophore groups and at least one resin of the mixture is at least substantially or completely free of chromophore groups. In a further aspect, systems are provided that include use of multiple underlying organic antireflective coating compositions that have differing absorbances of radiation used to image an overcoated photoresist composition layer.</p> |
申请公布号 |
KR20060089683(A) |
申请公布日期 |
2006.08.09 |
申请号 |
KR20060011316 |
申请日期 |
2006.02.06 |
申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. |
发明人 |
ZAMPINI ANTHONY;PAVELCHEK EDWARD K.;MORI JAMES MICHAEL |
分类号 |
G03F7/004;G03F7/027;G03F7/26 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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