| 摘要 |
The invention provides a method for restoring degraded characteristics of a ceramic heater which is a device for heating a semiconductor wafer under processing and has a layered structure consisting of, on one surface of a supporting substrate made of carbon or a carbon-based composite material, successively formed layers including an insulating layer, an electroconductive layer as an electric heating element and a dielectric layer. The inventive method comprises the steps of: a first stepp for partly or completely removing the layer or layers having degraded properties by means of a suitable method such as sabdblasting and a second step of re-forming the layer or layers having been removed in the first step. The invention provides a substantial cost decrease as compared with the conventional way by replacing the worn-out ceramic heater with a newly manufactured one. |
