发明名称 Thin film inspection apparatus and thin film inspection method
摘要 The measurement light radiated from a radiator 2 enters an object of inspection through an integrating sphere 22. The measurement light is reflected on a base 52 of the object or a thin film 54. Further, the reflected light enters the integrating sphere 22 and is equalized in the integrating sphere 22. After that, the equalized reflected light is led to a light splitter 12 through an optical fiber 10. The light splitter 12 splits the reflected light in the order of wavelength, and applies an electrical signal corresponding to the intensity spectrum to an arithmetic processor 14. The arithmetic processor 14 determines the state of the thin film 54 formed on the surface of the object based on the electrical signal received from the light splitter 12.
申请公布号 EP1688704(A1) 申请公布日期 2006.08.09
申请号 EP20060001473 申请日期 2006.01.24
申请人 OMRON CORPORATION 发明人 TSUCHIMICHI, KAZUMI;TAKAKURA, TAKESHI
分类号 G01B11/06 主分类号 G01B11/06
代理机构 代理人
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