发明名称 |
Chemical mechanical polishing retaining ring with integral polymer backing |
摘要 |
In one embodiment, the disclosure is directed to a chemical mechanical polishing retaining ring. The chemical mechanical polishing retaining ring includes a support formed of a first material comprising a first polymer and a wear portion formed of a second material comprising a second polymer. The first material has an elastic modulus greater than the elastic modulus of the second material.
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申请公布号 |
US7086939(B2) |
申请公布日期 |
2006.08.08 |
申请号 |
US20040804569 |
申请日期 |
2004.03.19 |
申请人 |
SAINT-GOBAIN PERFORMANCE PLASTICS CORPORATION |
发明人 |
WILKINSON DAVID;HAMILTON COLLEEN E.;HIRSCHORN BRYAN DAVID;MANGAUDIS MICHAEL JOHN |
分类号 |
B24B1/00;B24B37/04;B24B41/06 |
主分类号 |
B24B1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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