发明名称 |
Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing method |
摘要 |
When a pattern is transferred via a projection optical system, a size of an image of the pattern varies depending on a defocus amount of a transferring position from the best focus position, and a flucuation curve showing the variation (the so-called CD-focus curve) varies depending on wavefront aberration of the projection optical system. There is a close relation between a linear combination value of a plurality of terms that each have a coefficient (an aberration component) of a plurality of Zernike terms (aberration component terms) into which the wavefront aberration of the projection optical system is decomposed using a Zernike polynomial in series expansion, and the variation of the flucuation curve. Accordingly, by using the above relation, the CD-focus curve related to the pattern via a projection optical system whose aberration state is predetermined exposed under predetermined exposure conditions can be predicted within a short period of time by a simple calculation of obtaining the linear combination value of a plurality of terms that each have an aberration component.
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申请公布号 |
US7088426(B2) |
申请公布日期 |
2006.08.08 |
申请号 |
US20040927287 |
申请日期 |
2004.08.27 |
申请人 |
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发明人 |
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分类号 |
G03B27/52;G03B27/32;G03B27/42;G03F7/20 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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