发明名称 Structure and method of forming bipolar transistor having a self-aligned raised extrinsic base using self-aligned etch stop layer
摘要 A bipolar transistor structure and method of making the bipolar transistor are provided. The bipolar transistor includes a collector region, an intrinsic base layer overlying the collector region, and an emitter overlying the intrinsic base layer. An opened etch stop layer includes a layer of dielectric material overlying the intrinsic base, the opened etch stop layer self-aligned to the emitter. The bipolar transistor further includes a raised extrinsic base self-aligned to the emitter, the raised extrinsic base overlying the intrinsic base layer.
申请公布号 US7087940(B2) 申请公布日期 2006.08.08
申请号 US20040709220 申请日期 2004.04.22
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 KHATER MARWAN H.;PAGETTE FRANCOIS
分类号 H01L31/072;H01L21/331;H01L29/10;H01L29/417;H01L29/423;H01L29/732;H01L29/737;H01L31/0328;H01L31/0336 主分类号 H01L31/072
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