SPUTTERING TARGET MATERIAL

摘要

A sputtering target material by which generation of arcing phenomenon and splash phenomenon during sputtering are eliminated to the minimum. A friction stir process is performed to a part of the sputtering target material to be used for sputtering. The arcing phenomenon and the splash phenomenon during sputtering are surely suppressed, even the sputtering target material is composed of an aluminum alloy containing carbon or big.