发明名称 Routing design to minimize electromigration damage to solder bumps
摘要 A novel pad structure for an integrated circuit component that utilizes a bump interconnect for connection to other integrated circuit components that produces a relatively uniform current distribution within the bump of the bump interconnect is presented. The pad structure includes an inner pad implemented on an inner conductive layer of the integrated circuit component, an outer pad implemented on an outer conductive layer of the integrated circuit component, and a plurality of vias connecting the inner pad and outer pad. The outer pad is sealed preferably around its edges with a passivation layer, which includes an opening exposing a portion of the outer pad. The vias connecting the inner pad and outer pad are preferably implemented to lie in a via region within the footprint of the pad opening.
申请公布号 US2006170100(A1) 申请公布日期 2006.08.03
申请号 US20050048204 申请日期 2005.02.01
申请人 发明人 RICHLING WAYNE P.;DAUKSHER WALTER J.;GRAUPP WILLIAM S.
分类号 H01L23/48;H01L21/44 主分类号 H01L23/48
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