| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition etc. having high sensitivity and a good development margin, capable of forming an interlayer insulation film having excellent solvent resistance, heat resistance, light transmittance, relative dielectric constant, etc. and capable of forming microlenses having excellent solvent resistance, heat resistance, light transmittance etc. and a good melt shape. <P>SOLUTION: The radiation sensitive resin composition contains [A] an alkali-soluble copolymer comprising (a1) an unsaturated carboxylic acid (anhydride), (a2) an unsaturated compound having a (tetrahydro)furan ring structure, a (tetrahydro)pyran ring structure or a structure represented by formula (1) (where R denotes H or methyl and n is an integer of 2-10), and (a3) an unsaturated compound other than the above compounds, and [B] a 1,2-quinonediazido compound. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
