| 摘要 |
PROBLEM TO BE SOLVED: To form a metallic film more accurately and selectively for a mirror formed on a mirror substrate having a large level difference such as a frame part. SOLUTION: With a stencil mask 107 arranged on the frame part 101a, the vapor-deposited atoms 110 flying from a vapor deposition source through an opening 171 are made to reach the mirror 135, making a condition with a metallic film 108 formed only on the mirror 135. The stencil mask 107 is equipped, on a planar substrate 172, with an engaging part 173 that fits to the opening of the frame part 101a, wherein the opening 171 is formed on the tip end face 174 of the engaging part 173. The engaging part 173 corresponds to one part of the mirror 135 constituting a mirror array, with one circular opening 171 provided for each mirror. The tip end face 174 having the opening 171 is formed nearly in parallel to the flat face of the substrate 172. COPYRIGHT: (C)2006,JPO&NCIPI
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