| 发明名称 |
Ag base sputtering target and process for producing the same |
| 摘要 |
An Ag sputtering target 6 has three-dimensional fluctuation of grain sizes of not more than 18%. The fluctuation is determined by exposing plural sputtering surfaces by slicing the sputtering target 6 in planes to initial sputtering surface, selecting plural locations on each of the exposed sputtering surfaces, calculating values A1 and B1 using the formula below, and selecting larger one of the values A1 and B1 as the three-dimensional fluctuation of the grain sizes. <?in-line-formulae description="In-line Formulae" end="lead"?>A1=(D<SUB>max</SUB>-D<SUB>ave</SUB>)/D<SUB>ave</SUB>x100(%) <?in-line-formulae description="In-line Formulae" end="tail"?> <?in-line-formulae description="In-line Formulae" end="lead"?>B1=(D<SUB>ave</SUB>-D<SUB>min</SUB>)/D<SUB>ave</SUB>x100(%) <?in-line-formulae description="In-line Formulae" end="tail"?> D<SUB>max</SUB>: maximum value among the grain sizes D at all the selected locations D<SUB>min</SUB>: minimum value among the grain sizes D at all the selected locations D<SUB>ave</SUB>: average value of the grain sizes D at all the selected locations
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| 申请公布号 |
US2006169577(A1) |
申请公布日期 |
2006.08.03 |
| 申请号 |
US20040564502 |
申请日期 |
2004.07.14 |
| 申请人 |
KOBELCO RESEARCH INSTITUTE, INC. |
发明人 |
TAKAGI KATSUTOSHI;NAKAI JUNICHI;TAUCHI YUUKI;MATSUZAKI HITOSHI;FUJII HIDEO |
| 分类号 |
C22F1/14;C23C14/00;C22C5/06;C22F1/00;C23C14/34 |
主分类号 |
C22F1/14 |
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