| 摘要 |
A heating assembly ( 36 ) for heating a cathode ( 38 ) of an electron gun ( 30 ) of an exposure apparatus ( 10 ) includes a radiation source ( 42 ) and a beam shaper ( 44 ). The radiation source ( 42 ) generates a source beam ( 46 ). The beam shaper ( 44 ) receives the source beam ( 46 ) and selectively shapes the source beam ( 46 ) into a shaped beam ( 48 ) that is directed to the cathode ( 38 ). In certain embodiments, the beam shaper ( 44 ) can readily change the shape and intensity profile of the shaped beam ( 48 ) to achieve a desired electron beam ( 32 ) from the electron gun ( 30 ). In one embodiment, the radiation source ( 42 ) generates a pulsed source beam ( 46 ).
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