| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure method for giving an improved angular distribution of an exposure light (effective light distribution) even the transmission distribution of an optical system (pupil transmission distribution), and the effective light distribution difference at the center or the periphery of the substrate (effective light distribution difference at in or out of axis) is reduced. <P>SOLUTION: The exposure method employs an exposure instrument provided with a projection optical system for projecting the image of a mask pattern on a body to be exposed, and a lighting optical system for illuminating the mask by forming a secondary light source plane near a position conjugated to the pupil plane of the projection optical system. The exposure method has a step of measuring an uneven transmission distribution (pupil transmission distribution) for light emitted from each point on the secondary light source plane and entered into a point on the body to be exposed, and a step for regulating a light intensity distribution at the secondary light source plane to make its light intensity distribution has reverse tendency to that of the pupil transmission distribution. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
