| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for measuring film thickness capable of finding a film thickness value with precision equivalent to that in precise perpendicular incidence, from the maximum wavelength and the minimum wavelength of an acquired spectral reflectance data, even when using illumination light converged by an objective lens with a large numerical aperture. SOLUTION: A film thickness value calculated by a peak valley method is corrected to bring the true film thickness value in assumption that the film thickness value calculated by the peak valley method is a film thickness value including an influence of diagonal incidence of the illumination light in response to the numerical aperture of the objective lens. The correction is carried out by multiplying the film thickness value calculated by the peak valley method withθ<SB>2</SB>/sinθ<SB>2</SB>(≥1) as a correction factor. COPYRIGHT: (C)2006,JPO&NCIPI
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