发明名称 Electromagnetic system with a supply plate
摘要 The present invention relates to an electrochemical system ( 1 ) as well as to a supply plate ( 2 ) which is contained in this system. At least one supply plate is provided in this electrochemical system, wherein the supply plate on a first flat side comprises a first flowfield, and on a second flat side a second flowfield and the first flowfield is connected to an allocated first interface channel and the second flowfield to an allocated second interface channel, in a fluid-leading manner, or an individual interface channel is connected to the first and to the second flowfield in a fluid leading manner, wherein a transition region is arranged from at least one interface channel to the allocated flowfield or to the allocated flowfields, wherein this transition region on the first flat side comprises a first section and on the second flat side comprises a second section, for pressing a membrane bordering on the respective flat side, wherein the first and the second section are offset in the plane of the plate so that a reaction media flowing in each case on the sides which are distant to the pressing sides of the first and second channel may get from the interface channel to the flowfield or the flowfields.
申请公布号 US2006172177(A1) 申请公布日期 2006.08.03
申请号 US20050286577 申请日期 2005.11.23
申请人 SCHERER JOACHIM;RUESS BERND;GRAFL DIETER 发明人 SCHERER JOACHIM;RUESS BERND;GRAFL DIETER
分类号 H01M8/24;H01M8/02 主分类号 H01M8/24
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