RESIST REMOVING AGENT COMPOSITION FOR LIFT-OFF

摘要

PROBLEM TO BE SOLVED: To provide a resist removing agent for lift-off which can peel off and remove an overhanging resist pattern on a substrate in a short time, and which does not corrode a metal film and a method for manufacturing an electronic device using the same. SOLUTION: The resist removing agent composition for lift-off consists of 25-75 wt.% of specific glycol monoalkyl ether and 75-25 wt.% of another organic solvent that is liquid at 23°C in the atmospheric pressure. The method for manufacturing the electronic device includes steps of: forming a resist film of a negative type photoresist composition on the substrate; obtaining the substrate having the resist pattern by exposing the resist film in the pattern and developing it; forming the metal film on the substrate having the resist pattern; and removing the resist pattern from the substrate using the removing agent composition. COPYRIGHT: (C)2006,JPO&NCIPI