EXPOSURE DEVICE, EXPOSURE METHOD, AND MICRO DEVICE MANUFACTURING METHOD
摘要
<p>An exposure device transfers by exposure an image of a pattern projected via an optical system having optical units (L1 to L13) onto an object (P). The exposure device includes a correction device for correcting a position of at least one image among the images projected onto the object (P) by the optical units (L1 to L13) so as to compensate the fluctuation of the optical units (L1 to L13).</p>
