| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an immersion type exposure means capable of exposing via liquid and exposing the entire surface of a substrate including the end of the substrate to light since the liquid is accumulated between the lower surface of a projection optical means and the surface of the substrate also when exposing the end of the substrate to light when an immersion method is applied. <P>SOLUTION: The immersion type exposure device 100 comprises an illuminating means 211 for irradiating an original 101 with light; a substrate holding means 112 for holding the substrate 111 directly on a Z stage 113; and the projection optical means 121 for transferring the pattern of the original 101 onto the substrate 111, where the area between a tip section 123 of an optical element at the side of the substrate 111 of the projection optical means 121 and the surface of the substrate 111 is filled with liquid 301. In the immersion type exposure device 100, the substrate holding means 112 has a substrate tool 40 for surrounding the outer periphery of the substrate 111. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
