发明名称 STAGE DEVICE AND COATING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a stage device which is small in fluctuation of the suction pressure, and a coating device having the stage device. SOLUTION: A resist coating device 23a comprises a stage device 12 having a stage 200 to convey a substrate G in a floating manner, a substrate conveying mechanism 13 to convey the substrate G in X-direction on the stage 200, and a resist feed nozzle 14 to feed resist liquid on a surface of the substrate G to be conveyed in a floating manner on the stage 200. The stage 200 consists of small stages 201a-203a, 201b-203b. In the small stages 202a, 202b, gas ejection ports 16a and intake ports 16b are formed at a predetermined interval in the direction deviated with respect to Y-direction by the angleθso that a front end of the substrate G in X-direction does not simultaneously cover the intake ports 16b of the predetermined number, and a rear end of the substrate G in X-direction does not simultaneously open the intake ports 16b of the predetermined number to the atmosphere. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006199483(A) 申请公布日期 2006.08.03
申请号 JP20050015564 申请日期 2005.01.24
申请人 TOKYO ELECTRON LTD 发明人 INAMASU HISASHI;YAMAZAKI TAKESHI;MIYAZAKI KAZUHITO
分类号 B65G49/06;B05C13/02;H01L21/027;H01L21/677 主分类号 B65G49/06
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