摘要 |
PROBLEM TO BE SOLVED: To provide a stage device which is small in fluctuation of the suction pressure, and a coating device having the stage device. SOLUTION: A resist coating device 23a comprises a stage device 12 having a stage 200 to convey a substrate G in a floating manner, a substrate conveying mechanism 13 to convey the substrate G in X-direction on the stage 200, and a resist feed nozzle 14 to feed resist liquid on a surface of the substrate G to be conveyed in a floating manner on the stage 200. The stage 200 consists of small stages 201a-203a, 201b-203b. In the small stages 202a, 202b, gas ejection ports 16a and intake ports 16b are formed at a predetermined interval in the direction deviated with respect to Y-direction by the angleθso that a front end of the substrate G in X-direction does not simultaneously cover the intake ports 16b of the predetermined number, and a rear end of the substrate G in X-direction does not simultaneously open the intake ports 16b of the predetermined number to the atmosphere. COPYRIGHT: (C)2006,JPO&NCIPI
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