发明名称 PHOTODIODE HAVING HETERO-JUNCTION BETWEEN SEMI-INSULATING ZINC OXIDE SEMICONDUCTOR THIN FILM AND SILICON
摘要 <p>A photodiode which eliminates sensitivity reduction in a short wavelength region such as blue, an unavoidable problem posed by doping, resolves response reduction by the scattering of acceptor ions of impurities due to doping of impurities at the same time, and has very high sensitivity and fast response in a UV-IR range. A photodiode having a hetero-junction between a semi-insulating zinc oxide semiconductor thin film and silicon and comprising, basically, n-type silicon (1) and a semi-insulating zinc oxide semiconductor thin film (3) formed on the n-type silicon, characterized in that the n-type silicon forms a cathode region, and the formation of a semi-insulating zinc oxide semiconductor thin film produces a p-type inversion layer (4) at the upper portion of the n-type silicon in contact with the semi-insulating zinc oxide semiconductor thin film, the p-type inversion layer forming a photo-detection region and an anode region.</p>
申请公布号 WO2006080099(A1) 申请公布日期 2006.08.03
申请号 WO2005JP11047 申请日期 2005.06.16
申请人 KODENSHI CORPORATION;SHIMIZU, KATSUYA 发明人 SHIMIZU, KATSUYA
分类号 H01L31/109 主分类号 H01L31/109
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