发明名称 |
ALIGNMENT SYSTEM FOR NANO IMPRINT LITHOGRAPHY AND METHOD OF IMPRINT LITHOGRAPHY USING THE SAME |
摘要 |
<p>An alignment system used in nano-imprint lithography and a nano-imprint lithography method using the alignment system are provided. The alignment system includes: a plurality of electron emission devices, which are provided in the mold and emit electrons; and a plurality of electrodes, which are provided to face the electron emission devices and at which the electrons emitted from the electron emission devices arrive. The mold and the substrate are aligned with each other by maximizing the amount of current in each of the electrodes.</p> |
申请公布号 |
KR20060087880(A) |
申请公布日期 |
2006.08.03 |
申请号 |
KR20050008749 |
申请日期 |
2005.01.31 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHOI, SANG JUN;LEE, JUNG HYUN;LEE, SUK WON;LEE, MOON GU |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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