发明名称 POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a positive resist composition having high resolution and capable of enhancing DOF. <P>SOLUTION: In the positive resist composition, a resin component (A) whose alkali solubility is increased by the action of an acid has at least one constitutional unit (a1) selected from the group consisting of constitutional units represented by a general formula (a1-01) and constitutional units represented by a general formula (a1-02), and an acid generator component (B) which generates an acid upon exposure contains an onium salt-based acid generator (B1) having an anionic moiety represented by a general formula (b-3) or (b-4). <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006201402(A) 申请公布日期 2006.08.03
申请号 JP20050012053 申请日期 2005.01.19
申请人 TOKYO OHKA KOGYO CO LTD 发明人 KINOSHITA YOHEI
分类号 G03F7/039;C08F20/28;G03F7/004;H01L21/027 主分类号 G03F7/039
代理机构 代理人
主权项
地址